激光加热不仅仅加热迅速快，更重要的是它的稳定性与加热均匀的特性，不是一般电阻丝加热器所能比拟的。我们的激光加热只有样品拖是热的，其他的部件相对传统加热器来说相当冷，所以它的机械性能就比较好。不会在真空中卡住，或者是有大幅度的放气，导致样品表面之前的杂质又回镀到样品的表面，这是激光加热最大的好处，同时因为加热器不在真空腔体内，所以不会有加热器故障的问题。

 

我们的激光加热器加热样品架在所有PLD的应用里有世界最大的激光功率200W，所以可以非常轻易的到达1000摄氏度以上的温度，而且尤有余裕。当样品成长需要高气压的时候，功率马上跟上，不需要慢慢等样品由冷变热回到原来的温度。可以安装红外线测温仪，量测样品表面的实际温度。我们有两寸激光加热器与高功率的触酶催化剂的应用。欢迎各位科学家前来咨询。

 

我们用我们的激光加热器成功的帮助数位科学家解决了加热温度低的问题。

 

5-AXES UHV LASER HEATING MANIPULATOR

 

MAIN SPECIFICATIONS:

• Laser power: 200W
• Substrate size: 10x10 mm2 (up to 1-in dia)
• Heating temperature 1200°C (E-3 torr and below) or 1000°C (above E-3 torr) Fully compatible to oxygen-rich or any atmospheric condition
• ±1°C temperature stability
• PID temperature control
• XYZ axis movements
• 360° continuous rotation
• 5° substrate tilt
• Fan and Water cooling system
• Pneumatic substrate shutter
• Real-time temperature monitor by pyrometer (single wavelength, can monitor > 260°C)
• State-of-the-art and easy operation computer software control
• For high temperature applications
• For Oxide-, or any atmospheric condition applications
• Compatible with all UHV systems
• Customizable

COMPATIBILITY TO OXYGEN-RICH OR ANY ATMOSPHERIC CONDITIONS

 

 

Designing a high temperature heater for UHV thin-film deposition systems which can work in oxygen-rich or any atmospheric conditions is not easy. Conventional heating materials and mechanisms generate additional vapor pressure from its heating component materials which limits the achievable UHV condition, and oxidize its heating components which consequently deteriorate the heating material and process quality

There are some techniques to overcome this problem, such as Platinum heating element, SiC heating element with well-designed shape, etc. However, each methods has their own issues, such as high maintenance frequency, short life time due to oxidation of heating components, etc.

 

AdNaNoTek's Laser heating manipulator is developed as a perfect solution for heating your sample for UHV thin-layer deposition in oxygen-rich and any atmospheric conditions. It does not possess the disadvantages that other heaters have. In addition, it is easy-to-use, compact, customizable, and has fast and localized heating mechanism. It is equipped with a pyrometer to monitor the temperature, and has a system control software to automatically control the laser heating parameters and processes.  AdNaNoTek's Laser Heating Manipulator is very suitable for laser oxide/nitride epitaxial techniques.

 

LASER CONTROLLER COMBINES NUMBER OF LEADING TECHNOLOGIES SUCH AS...

• Laser heater module with power supply (standard 200W)
• Optical fiber
• Focusing lens with adjustable support
• Infrared pyrometer for temperature monitoring (with adjustable support)
• PID temperature control
• RS232 communication port for remote controlling
• Control software for real time temperature monitoring, controlling, and alarm

ADVANTAGES

• Heating temperature 1200°C (E-3 torr and below) or 1000°C (above E-3 torr) Fully compatible to oxygen-rich or any atmospheric condition
• No heating components adds in vapor pressure in the chamber
• Localized heated area, lesser out-gassing during heating (you can deposit with a cleaner condition)
• Can process with rapid temperature ramping
• Easier maintenance compare to traditional substrate heater (the heating element is outside of the vacuum)
• Direct temperature measurement from sample/substrate by pyrometer

OPTIONAL

• Liquid nitrogen cooling
• Customizable manipulator
• Pulsed heating mode