Adnano-tek中国区联系方式  于淼 :152 2727 0411 yumiao@adnano-tek.com 

 

我们的双电子束蒸发系统有如下优点:

 

腔体适中,不会太大也不会太小。可使用冷泵或者大抽速分子泵。所以抽气速度很快。在使用分子泵的情况下,非常节能省电。极限真空8E-8torr。我们的样品架有几种可以供客户选择:1、单伞锅,只能自转。2、多伞锅,可行星式旋转。3、选择与倾斜的样品架(此技术本公司独有),在特殊情况下可保证样品不超过80摄氏度,这对工艺要求比较严苛使用者来说非常重要,因为光刻胶遇到高温会起泡,所以希望温度越低越好。适用于金属沉积,金属剥离工艺。

 

电子枪可选用日本爱发科,美国泰利玛,双晶振可以减少因晶振失误导致的样品报废的困扰。

 

我们有另外一型单电子束热蒸发联用系统。

 

UHV Dual E-Beam Evaporator (EBS300)

AdNaNoTek’s Dual EBS300 can deposit large-scale thin-film with extremely high quality and a great repeatability. It is equipped with 2 e-beam sources. Each e-beam sources is installed with multiple target crucibles which can store up to maximum of 6 target materials. Since it has 2 e-beam sources, this allows simultaneous deposition of 2 different materials onto your substrates. In addition, it is also equipped with sample planetary mechanism which rotate and revolve multiple samples. This allows precise and simultaneous deposition of in many substrates while significantly improving the uniformity and quality of the deposited thin-film.

Furthermore, precise control and high stability is achieved by making the process automated with the use of the AdNanoTek's FBBEAR system control software. FBBEAR, provides complete data logging, precise parameter tuning, and automatic parameter setting of the deposition process. This makes the deposition process to be operated with ease, fully automated, user-friendly, consistent, and will give reliable experimental repeatability.

E-Beam evaporator can be applied for thin layer deposition of materials like: metals (Al, Nb, Ge, etc.), dielectrics, oxides (SiO2, Ta2O5, Al2O3, etc.), semiconductors and several alloys.